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Cand. Sci. (Eng.), Director of the Scientific and Technical Center for Photomask Blanks, National Research University of Electronic Technology (Russia, 124498, Moscow, Zelenograd, Shokin sq., 1)

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Investigation of the adhesion strength of functional layers of photomasks and photomask blanks with design standards of 90–65 nm

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Investigation of the formation process and stability of Mo-Si and Ta-Si based phase-shifting layers for photomasks under DUV with 248 nm wavelength exposure

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Heterocompositions nanoscale layers characterization using digital processing of transmission electron microscopy data

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Composition control of Mo-Si-N-O thin films during reactive magnetron sputtering

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Simulation of the diffraction effects using phase-shifting layers in photolithography

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27.04.2026 Vol. 31, no. 2, 2026 has been published

Dear colleagues!
We are pleased to inform you that latest issue of scientific and technical journal "Proceedings of Universities. Electronics", vol. 31, no. 2, 2026, has been published on April 15, 2026.

11.03.2026 Vol. 31, no. 1, 2026 has been published

Dear colleagues!
We are pleased to inform you that latest issue of scientific and technical journal "Proceedings of Universities. Electronics", vol. 31, no. 1, 2026, has been published on February 16, 2026.

25.02.2026 Please be advised

Starting from 2027, according to Notice received by our Editorial Office, the Pleiades Publishing group of companies discontinues the collaboration with our journal.
Articles published in the Journal “Proceedings of Universities. Electronics” will not be included in additional issues of the journals Semiconductors (iss. 13) and Russian Microelectronics (iss. 7) anymore.

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