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The formation of nanostructures by the method of the chemical precipitation from the gas phase using PECVD and glow-discharge plasma has been considered. The investigations were carried out in the 3000 - 700 °C temperature range. The influence of the Ni catalyst thickness and of the concentration of the carbon-containing components in vapor phase on the carbonic deposit structure has been studied. The productive growth of the homogeneous vertical nanotubes and grapheme flakes at 350 °C has been obtained. The electrophysical features of the obtained structures have been studied.
Sergey V. Dubkov
National Research University of Electronic Technology, Moscow, Russia

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