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Izvestiya Vysshikh Uchebnykh Zavedenii. Elektronika: Elektronika
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Izvestiya Vysshikh Uchebnykh Zavedenii.
Elektronika
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Izvestiya Vysshikh Uchebnykh Zavedenii. Elektronika
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Elektronika
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PhD student of the Institute of Integrated Electronics, engineer of the Scientific and Technological Center of Photomasks, National Research University of Electronic Technology (Russia, 124498, Moscow, Zelenograd, Shokin sq., 1)
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phase-shifting photomask
magnetron sputtering
deep ultraviolet exposure
photolithography
photomask
diffraction pattern
Fourier optics
contrast
phase-shifting material lines
transmittance
reactive magnetron sputtering
phase-shifting phototemplates
nitridation
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Investigation of the formation process and stability of Mo-Si and Ta-Si based phase-shifting layers for photomasks under DUV with 248 nm wavelength exposure
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Composition control of Mo-Si-N-O thin films during reactive magnetron sputtering
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Simulation of the diffraction effects using phase-shifting layers in photolithography
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