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The method of the multiparameter measurements of characteristics of semiconductor structures: the electrical conductivity of the n-layer, which acts as a substrate of the semiconductor structure, the thickness and conductivity of the highly doped epitaxial n-layer, has been proposed. The method is based on using the one-dimensional microwave photonic crystal with the periodicity defect, which contains the investigated semiconductor structure. The characteristics, measured by this method, of epitaxial arsenide-gallium structures, consisting of the epitaxial layer and semi-isolating substrate, have been presented.

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