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The results of the study on the parameters of permalloy films, produced by the electrochemical deposition in the local areas, limited by the photoresist mask on metallic surface of silicon wafer, have been presented. The experimental dependencies of magnetic parameters of the deposited permalloy on the electrolyte excerpt time have been obtained. The possibility of application of the deposited films as the magnetic field screens of the digital isolators with galvanic separation on the basis of magnetic nanostructures has been shown.

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