Persons

Andrey M. Sokolov

National Research University of Electronic Technology, Moscow, Russia; “Angstrem” JSC, Moscow, Russia
Master’s degree student of the Institute of Advanced Materials and Technologies, National Research University of Electronic Technology (Russia, 124498, Moscow, Zelenograd, Shokin sq., 1), Process Engineer of the Thin Film Deposition Laboratory, “Angstrem” JSC (Russia, 124460, Moscow, Zelenograd, Shokin sq., 2)

Tatyana A. Babich

National Research University of Electronic Technology Moscow, Russia
Laboratory Assistant of the Institute of Advanced Materials and Technologies, National Research University of Electronic Technology (Russia, 124498, Moscow, Zelenograd, Shokin sq., 1)

Daria D. Glebova

National Research University of Electronic Technology Moscow, Russia
Engineer of the Institute of Advanced Materials and Technologies, National Research University of Electronic Technology (Russia, 124498, Moscow, Zelenograd, Shokin sq., 1)

Irina A. Voloshchuk

National Research University of Electronic Technology Moscow, Russia
Engineer of the Institute of Advanced Materials and Technologies, National Research University of Electronic Technology (Russia, 124498, Moscow, Zelenograd, Shokin sq., 1)

Valeriy A. Tarasov

SMC "Technological Centre", Moscow, Russia