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Maskless lithography is a promising microfabrication technique. However, existing optical control systems have featured diffraction limitations, thermal and vibrational disturbances, and feedback loop delays. Because of this devices high resolution is unattainable in mass production. The research aims to develop a predictive wavefront correction method to overcome the shortcomings. The thermal and vibrational processes in digital micromirror devices (DMD) mathematical modeling method, linear-quadratic regulator (LQR), and optical system dynamics numerical simulation were applied in this work. A mathematical model for predicting thermal and vibrational disturbances through eigenvalues reduction method and LQR-based predictive correction algorithm was proposed. Numerical simulation results showed the proposed method provides thermal disturbances compensation in projection optics in 0.3 ms with residual error no more than 10 nm (λ/40 for 405 nm wavelength) that is 30 % faster than traditional PID controllers. It also ensures 35–40 % accuracy improvement. The proposed predictive correction method has allowed lithography speed increase by 30 % without resolution loss. The method can be integrated into serial equipment with minimal modernization. Thus, new possibilities for high-performance submicron structure fabrication arise.
Dmitrii A. Gubin
National Research University of Electronic Technology, Russia, 124498, Moscow, Zelenograd, Shokin sq., 1
Anatolii V. Schagin
National Research University of Electronic Technology, Russia, 124498, Moscow, Zelenograd, Shokin sq., 1

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