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Silicon wafer position fixing in a plasma chemical etcher is done using the electrostatic chuck (ESC). Process efficiency improving requires ESC advancement in enhancing the magnitude and uniformity of clamping pressure distribution across the wafer surface with account for need of effective heat dissipation. In this work, a theoretical estimation of the ponderomotive force arising in a monopolar ESC was performed using a Coulomb approximation and calculated estimates were compared with experimental data. An analytical expression for the electrostatic ponderomotive force was derived, considering the complex multilayer structure of the ESC (silicon – helium – ceramic – tungsten) and the microrelief pattern on the ceramic. The surface roughness of the microrelief was incorporated into the model. It has been established according to calculations that the clamping force is sensitive to parameters such as the area of contact and non-contact regions, the contact ratio between the silicon wafer and the ESC ceramic, and the thickness of the top ceramic layer. The simulation results across all test series demonstrate good agreement with experimental measurements of the ponderomotive force arising in a monopolar ESC with the following characteristics: VK100-DN ceramic with Al2O3 content of at least 99.6 %, ε = 10.0 at U = 1.5 kV for a 150 mm wafer.
  • Key words: electrostatic chuck, electrostatic fixing device, ESC, electroadhesion, plasma chemical etching, PCE, ponderomotive force
  • Published in: TECHNOLOGICAL PROCESSES
  • Bibliography link: Manilova G. V., Traktirshchikov V. S., Shiryaev M. E. Calculation of the ponderomotive force of the electrostatic chuck of monopolar type in a plasma chemical etcher. Izv.vuzov. Elektronika = Proc. Univ. Electronics.2025;30(4):442–450. (InRuss.).https://doi.org/10.24151/1561-5405-2025-30-4-442-450.
  • Financial source: the work has been supported by the Russian Science Foundation (grant no. 24-91-20003), https://rscf.ru/project/24-91-20003/. Acknowledgments: the authors express their gratitude to Dr.Sci.(Phys.-Math.), Prof.N. I. Borgardt for valuable comments and suggestions.
Galina V. Manilova
National Research University of Electronic Technology (Russia, 124498, Moscow, Zelenograd, Shokin sq., 1)
Viktor S. Traktirshchikov
National Research University of Electronic Technology (Russia, 124498, Moscow, Zelenograd, Shokin sq., 1) JSC “Scientific and Production Enterprise “Electronic Special-Technological Equipment” (Russia, 124498, Moscow, Zelenograd, Georgievsky Ave, 5, bld).
Maxim E. Shiryaev
LLC “ESTIKA” ” (Russia, 124498, Moscow, Zelenograd, Georgievsky Ave, 5, bld. 1)

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